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Fall 2018

Nanoscience Technology Courses:

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NST202 - Basic Nanotechnology Processes

Credits: 3

Catalog Description: Introduces students to the: top down, bottom up and hybrid nanofabrication; additive processes and sputtering; plasma, plasma setups and plasma deposition; subtractive processes and etching; RIE; wet etching; pattern transfer and lithography techniques; typical LPCVD systems for top down applications; 1D materials in bottom up applications; physical vapor deposition. Pre-requisite: NST 201; Co-requisite: NST 206

Lecture: 2 hrs.

Lab: 2 hrs.

Course Learning Outcomes (CLOs):
Upon successful completion of this course, the student will be able to:

1. Describe main nanofabrication processes.
2. Run basic additive and subtractive nanotechnology processes and equipment.
*3. Conduct pattern transfer and implement basic lithography techniques.
4. Effectively and safely work as a member of technical team on laboratory assignments.


* This course objective has been identified as a student learning outcome that must be formally assessed as part of the Comprehensive Assessment Plan of the college. All faculty teaching this course must collect the required data and submit the required analysis and documentation at the conclusion of the semester to the Office of Institutional Research and Assessment.


Content Outline:
1. Nanofabrication processing
2. Plasma basics
3. Additive processes and sputtering
4. Plasmas and deposition
5. Subtractive processes and etching
6. Reactive ion etching
7. Wet etching
8. Pattern transfer and lithography techniques
9. Typical LPCVD systems/hardware and top down applications
10. Physical vapor deposition

Effective Term: Fall 2015